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Single and multi-channel Al-based multilayer systems for space applications in EUV range

TitreSingle and multi-channel Al-based multilayer systems for space applications in EUV range
Type de publicationConference Paper
Year of Publication2013
AuteursMeltchakov, E, De Rossi, S, Mercier, R, Varniere, F, Jérome, A, Auchere, F, Zhang, X, Roulliay, M, Delmotte, F
Conference NameSociety of Photo-Optical Instrumentation Engineers (SPIE) Conference Series
Date PublishedMay 1, 2013

We report on further development of reflective multilayer coatings containing aluminum as low absorbing material for the extreme ultra-violet (EUV) applications, in particular for solar physics. Optimizations of the multilayer design and deposition process have allowed us to produce Al-based multilayers having relatively low interface roughness and record EUV reflectances in the range from 17 to 40 nm. The peak reflectance values of 56 % at 17.5 nm, 50 % at around 21 nm, and 42 % at 32 nm were achieved with new three-material multilayers Al/Mo/SiC and Al/Mo/B4C at near-normal incidence. We observe a good temporal stability of optical parameters of the multilayers over the period of 4 years. Moreover, the multilayer structure remains stable upon annealing at 100 °C in air during several weeks. We will discuss the optical properties of more complex Al-based systems with regard to the design of multilayer coatings that reflect more than one wavelength and reject some others within the spectral range from 17 to 40 nm. Such multichannel systems with enhanced reflectance and selectivity would provide a further advance in optical performance and compactness of EUV solar imaging instruments. We will discuss general aspects of design, optimization and fabrication of single- and multi-channel multilayer mirrors made with the use of aluminum. We will present recent results on the EUV reflectivity of multilayer coatings based on the Al/Mo/SiC and Al/Mo/B4C material combinations. Al-based multilayer systems are proposed as optical coatings in EUV telescopes of future space missions and in other EUV applications.

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