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EUV reflectivity and stability of tri-component Al-based multilayers

TitreEUV reflectivity and stability of tri-component Al-based multilayers
Type de publicationConference Paper
Year of Publication2011
AuteursMeltchakov, E, Ziani, A, Auchere, F, Zhang, X, Roulliay, M, De Rossi, S, Bourassin-Bouchet, C, Jérome, A, Bridou, F, Varniere, F, Delmotte, F
Conference NameSociety of Photo-Optical Instrumentation Engineers (SPIE) Conference Series
Date PublishedSeptember 1, 2011

We report on further development of three-material multilayer coatings made with a use of aluminum for the extreme ultra-violet (EUV) applications such as solar physics, high-order harmonic generation or synchrotron radiation. It was found that an introduction of refractory metal in Al-based periodic stack helps to reduce significantly an interfacial roughness and provides for a higher theoretical reflectance in the spectral range from 17 to 40 nm. The normal incidence reflectivity as high as 55 % at 17 nm, 50 % at 21 nm and 42 % at 30 nm was achieved with the new Al/Mo/SiC and Al/Mo/B4C multilayer mirrors, which have been optimized, fabricated and characterized with x-rays and synchrotron radiation. A good temporal and thermal stability of the tri-component Al-based multilayers has been observed over 3 years.

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